Issue 41, 2019

Capillary liquid bridge soft lithography for micro-patterning preparation based on SU-8 photoresist templates with special wettability

Abstract

Patterned micro-nano arrays have shown great potential in the fields of optics, electronics and optoelectronics. In this study, a strategy of interface-induced dewetting assembly based on capillary liquid bridges and SU-8 photoresist templates is proposed for patterning organic molecules and nanoparticles. First, photoresist templates with chemical stability were prepared via a simplified lithography method. Then the interface wettability and the contact angle hysteresis of water droplets on the fluorosilane modified templates were adequately studied and discussed. Subsequently, a sandwich structure, composed of a superhydrophilic target substrate, a hydrophobic high adhesive photoresist template and a growth solution were introduced for the confined space dewetting assembly. The related mechanism was investigated and revealed, with the assistance of in situ observation via a fluorescence microscope. Finally, the patterned arrays of water-soluble organic small molecules and aqueous dispersed nanoparticles were successfully obtained on the target substrates. This method is simple and easy, and the SU-8 photoresist templates possess a series of advantages such as low processing cost, short preparation periods and reusable performance, which endow this strategy with potential for application in molecular functional devices.

Graphical abstract: Capillary liquid bridge soft lithography for micro-patterning preparation based on SU-8 photoresist templates with special wettability

Supplementary files

Article information

Article type
Paper
Submitted
07 Jun 2019
Accepted
29 Jul 2019
First published
02 Aug 2019
This article is Open Access
Creative Commons BY-NC license

RSC Adv., 2019,9, 23986-23993

Capillary liquid bridge soft lithography for micro-patterning preparation based on SU-8 photoresist templates with special wettability

H. Wang, X. Li, K. Luan and X. Bai, RSC Adv., 2019, 9, 23986 DOI: 10.1039/C9RA04281D

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