Correction: Study on photoelectric characteristics of monolayer WS2 films
Abstract
Correction for ‘Study on photoelectric characteristics of monolayer WS2 films’ by Lin Wang et al., RSC Adv., 2019, 9, 37195–37200.
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* Corresponding authors
a
Femtosecond Laser Laboratory, Key Laboratory of Physics and Technology for Advanced Batteries (Ministry of Education), College of Physics, Jilin University, Changchun 130012, P. R. China
E-mail:
yinghui_wang@jlu.edu.cn, chixc@jlu.edu.cn
b State Key Laboratory of Superhard Materials, College of Physics, Jilin University, Changchun 130012, P. R. China
Correction for ‘Study on photoelectric characteristics of monolayer WS2 films’ by Lin Wang et al., RSC Adv., 2019, 9, 37195–37200.
L. Wang, W. Wang, Q. Wang, X. Chi, Z. Kang, Q. Zhou, L. Pan, H. Zhang and Y. Wang, RSC Adv., 2019, 9, 38943 DOI: 10.1039/C9RA90088H
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