Issue 47, 2020

An effective method for elimination of the defects in diamond caused by physical field asymmetry in high-pressure synthesis cavities

Abstract

In this work, we found that growth defects with terrace pits were formed during the growth of diamond synthesized for a long time using a temperature gradient growth method under high pressure and high temperature conditions. To explain the formation of defects, the temperature field and flow field under the catalyst growth conditions were analysed for the first time using finite element method simulations. The simulation results accurately explain the formation mechanism of growth defects on diamond crystals, with the calculated results showing good agreement with the experimental data. Excitingly, we propose two simple and effective methods for the elimination of the defects by merely adjusting the catalyst thickness and diameter. These methods not only improve the quality of large single crystal diamond, but also help to reduce the cutting cost of commercial diamond.

Graphical abstract: An effective method for elimination of the defects in diamond caused by physical field asymmetry in high-pressure synthesis cavities

Article information

Article type
Paper
Submitted
19 Aug 2020
Accepted
26 Oct 2020
First published
27 Oct 2020

CrystEngComm, 2020,22, 8266-8273

An effective method for elimination of the defects in diamond caused by physical field asymmetry in high-pressure synthesis cavities

C. Wang, H. Ma, L. Chen, S. Fang, J. Wang, Z. Lu, Q. Chen and X. Jia, CrystEngComm, 2020, 22, 8266 DOI: 10.1039/D0CE01210F

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements