Issue 24, 2024

Modelling the growth reaction pathways of zincone ALD/MLD hybrid thin films: a DFT study

Abstract

ALD/MLD hybrid thin films can be fabricated by combining atomic layer deposition (ALD) and molecular layer deposition (MLD). Even though this deposition method has been extensively used experimentally, the computational work required to acquire the reaction paths during the thin film deposition process is still in dire demand. We investigated hybrid thin films consisting of diethyl zinc and either 4-aminophenol or hydroquinone using both gas-phase and surface reactions to gain extensive knowledge of the complex phenomena occurring during the process of hybrid thin film deposition. We used density functional theory (DFT) to obtain the activation energies of these kinetic-dependent deposition processes. Different processes of ethyl ligand removal as ethane were discovered, and we found that the hydroxyl group of 4-aminophenol was more reactive than the amino group in the migration of hydrogen to an ethyl ligand within a complicated branching reaction chain.

Graphical abstract: Modelling the growth reaction pathways of zincone ALD/MLD hybrid thin films: a DFT study

Supplementary files

Article information

Article type
Paper
Submitted
18 Jan 2024
Accepted
23 May 2024
First published
24 May 2024
This article is Open Access
Creative Commons BY license

Phys. Chem. Chem. Phys., 2024,26, 17334-17344

Modelling the growth reaction pathways of zincone ALD/MLD hybrid thin films: a DFT study

M. Mäkinen, T. Weckman and K. Laasonen, Phys. Chem. Chem. Phys., 2024, 26, 17334 DOI: 10.1039/D4CP00249K

This article is licensed under a Creative Commons Attribution 3.0 Unported Licence. You can use material from this article in other publications without requesting further permissions from the RSC, provided that the correct acknowledgement is given.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements