Issue 35, 2024

Electrical contact property and control effects for stable T(H)-TaS2/C3B metal–semiconductor heterojunctions

Abstract

Metal–semiconductor heterojunctions are the basis for developing new electronic devices. Here, T(H)-TaS2/C3B metal–semiconductor heterostructures are constructed by different phase T- and H-TaS2 monolayers combined with the C3B monolayer. The calculated corrected binding energies, phonon band structures, elastic constants, and molecular dynamics simulations indicated that both heterojunctions are highly stable, meaning that T(H)-TaS2/C3B heterojunctions possibly exist in experiments. The electronic property calculations showed that the intrinsic T(H)-TaS2/C3B heterojunction is an n(p)-type Schottky contact with a low Schottky barrier height (SBH), which is very important for the design of high-performance field-effect transistors. The electronic properties of the T(H)-TaS2/C3B heterojunctions can be controlled by varying the vertical strain and external electric field; however, the strain only resulted in a small change in the heterojunction SBH. Nevertheless, under external electrical field control, the T-TaS2/C3B heterojunction could manage a transition from an n-type Schottky contact to an n-type Ohmic contact and the H-TaS2/C3B heterojunction could be altered from a p-type Schottky contact to a p-type Ohmic contact. These findings provide theoretical insights into the electronic and electrical contact properties of the T(H)-TaS2/C3B heterojunction, which could be beneficial for developing n-type MOS and p-type MOS transistors.

Graphical abstract: Electrical contact property and control effects for stable T(H)-TaS2/C3B metal–semiconductor heterojunctions

Supplementary files

Article information

Article type
Paper
Submitted
05 Jun 2024
Accepted
06 Aug 2024
First published
10 Aug 2024

Phys. Chem. Chem. Phys., 2024,26, 22968-22981

Electrical contact property and control effects for stable T(H)-TaS2/C3B metal–semiconductor heterojunctions

S. Cao, Z. Li, J. Han and Z. Zhang, Phys. Chem. Chem. Phys., 2024, 26, 22968 DOI: 10.1039/D4CP02283A

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