ZnO vapor phase infiltration into photo-patternable polyacrylate networks for the microfabrication of hybrid organic–inorganic structures

Abstract

Photopatterning of polymers enables the microfabrication of numerous microelectronic, micromechanical, and microchemical systems. The incorporation of inorganics into a patterned polymer material can generate many new interesting properties such as enhanced stability, optical performance, or electrical properties. Vapor phase infiltration (VPI) allows for the creation of hybrid organic–inorganic materials by infiltrating polymers with gaseous metalorganic precursors. This study seeks to explore the potential of integrating VPI with existing photopatterning techniques to achieve top-down hybridization and property modification of polymer structures of different complexity. For this, VPI of diethylzinc (DEZ) is studied for four highly crosslinked acrylate networks that can be patterned by photolithography and two-photon polymerization (2PP): pentaerythritol triacrylate (PETA), pentaerythritol tetraacrylate (PETeA), trimethylolpropane triacrylate (TMPTA) and ethoxylated trimethylolpropane triacrylate (ETPTA). The findings show that for highly crosslinked polymer networks, VPI can be limited by slow precursor diffusion. However, by introducing flexible segments (e.g., ethoxylated chains), the polymer's free volume can be increased, and infiltration is accelerated, leading to faster infiltration times and higher and more uniform inorganic loading. Finally, selective infiltration of ZnO into photolithographically patterned copolymer networks of TMPTA and ETPTA on non-infiltrating poly(methyl methacrylate) (PMMA) is demonstrated illustrating the potential of VPI for advanced maskless patterning strategies.