Advances in direct optical lithography of nanomaterials

Abstract

The precise assembly of nanomaterials is essential for integrating nanomaterials into sophisticated devices. However, conventional nanoscale patterning methods face obstacles such as high cost, low resolution, and environmental contamination. Direct optical lithography is used to fabricate photosensitive nanomaterials using surface engineering and utilizes the photochemical reactions of ligands to alter their solubility, enabling optical patterning. This method, which does not rely on polymer photoresists, holds great potential as an emerging lithographic technology. This approach simplifies the lithography process, reduces costs, and minimizes the environmental impact. In this review, we begin with an in-depth analysis of the evolution of optical lithography and key optical pattern strategies. We then emphasize how advanced nanomaterials, such as quantum dots, metal oxides, metals, clusters, and metal–organic frameworks, contribute to precise patterning for electronic and optoelectronic applications. Finally, we discuss current challenges in this field and propose solutions to improve patterning efficiency and quality while addressing issues about environmental sustainability.