Issue 9, 2024

Microreactor assisted soft lithography of nanostructured antimony sulfide thin film patterns: nucleation, growth and application in solid state batteries

Abstract

This study explores the microreactor-assisted soft lithography (MASL) method for direct, one-step synthesis and patterning of additive-free antimony sulfide (Sb2S3) nanostructured thin films. The results reveal the steady state process and its ability to overcome the challenges and limitations of conventional solution deposition processes. This new approach, exploiting continuous flow, prevents the dissolution of the growing film, a common issue in batch solution deposition methods. Furthermore, this study successfully fabricates functional Sb2S3–Li coin cell prototypes, demonstrating stable specific capacities of 600 mA h g−1 for over 260 cycles at a C/2 charge rate and coulombic efficiencies of 96–98%.

Graphical abstract: Microreactor assisted soft lithography of nanostructured antimony sulfide thin film patterns: nucleation, growth and application in solid state batteries

Supplementary files

Article information

Article type
Paper
Submitted
01 Jul 2024
Accepted
11 Aug 2024
First published
12 Aug 2024
This article is Open Access
Creative Commons BY-NC license

Energy Adv., 2024,3, 2200-2211

Microreactor assisted soft lithography of nanostructured antimony sulfide thin film patterns: nucleation, growth and application in solid state batteries

B. Chun, V. V. K. Doddapaneni, M. Lucero, C. Pan, Z. Gao, Z. Feng, R. Malhotra and C. Chang, Energy Adv., 2024, 3, 2200 DOI: 10.1039/D4YA00436A

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