Review of the effect and progress of uniform films prepared by magnetron sputtering method

Abstract

Recent advances in thin film materials have attracted considerable scientific interest owing to their exceptional physicochemical properties and broad applicability in emerging technological domains such as energy harvesting, electronic devices, and display technologies. The continuous development of thin film technology and sophisticated characterization methods has placed increasing demands on achieving precise control over film performance characteristics. As critical parameters governing functional performance, film thickness and uniformity represent fundamental metrics requiring comprehensive investigation. This highlight focuses on the effects of film thickness and uniformity on film structural properties, the influencing factors and measurement methods of magnetron sputtering coating, and the research progress of several popular films. In the future, thin film technology will continue to evolve, making sustained contributions to the advancement of various fields.