Improvement of the chemical and physical gas adsorption ability of poly(3-hexylthiophene) thin films by ultraviolet-ozone exposure

Abstract

Organic semiconductors are emerging as replacements for inorganic semiconductors, which are too rigid and heavy to be utilized in next-generation devices such as electronic skins (e-skins). However, organic sensors display a lower reactivity and selectivity with target gases than inorganic semiconductor-based gas sensors. In particular, organic sensors face critical limitations in that they have low charge density and surface energy. To address these limitations, we applied ultraviolet-ozone (UV-O3) treatment to modify the surface of poly(3-hexylthiophene) (P3HT) thin films with the aim of enhancing their gas-sensing performance. Among the gas sensor devices, the P3HT sensor treated with UV-O3 for 30 s exhibited remarkable sensing characteristics, achieving a sensitivity of 1.5%/ppm and a limit of detection of 21.5 ppb for NO2 gas. The UV-O3 treatment induces two primary effects: oxidation of the polymer surface and etching of the polymer chains. These changes have a profound impact on the P3HT film's physical and chemical properties. The oxidation and chain scission of the P3HT film induced by UV-O3 increased the hydrophilicity and free volume of the active layer. These modifications were observed to enhance the sensitivity and selectivity of the sensor toward NO2 gas by improving the interaction between gas molecules and the permeability in the channel region.

Graphical abstract: Improvement of the chemical and physical gas adsorption ability of poly(3-hexylthiophene) thin films by ultraviolet-ozone exposure

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Article information

Article type
Paper
Submitted
06 Jan 2025
Accepted
26 Apr 2025
First published
06 May 2025
This article is Open Access
Creative Commons BY license

J. Mater. Chem. C, 2025, Advance Article

Improvement of the chemical and physical gas adsorption ability of poly(3-hexylthiophene) thin films by ultraviolet-ozone exposure

N. Gu and Y. D. Park, J. Mater. Chem. C, 2025, Advance Article , DOI: 10.1039/D5TC00053J

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