Dual-anchor interface engineering with a phosphonic acid modifier for improving perovskite solar cell performance

Abstract

Solution-processed planar SnO2 electron transport layers (ETLs) fabricated via sol–gel methods offer promising scalability for manufacturing perovskite solar cells (PSCs). However, inherently, interfacial defects at both the SnO2 surface and the perovskite buried surface severely degrade device performance. Interface engineering of SnO2 ETLs using molecular modifiers presents a promising pathway toward high-performance PSCs. In this work, we propose a dual-functional interface engineering strategy employing aminomethylphosphonic acid (AMPA), an amphiphilic molecule featuring complementary –NH2 and –PO3H2 functional groups, to simultaneously regulate charge transport dynamics and crystallization kinetics. The phosphonic acid group is firmly bound to the surface of SnO2, which effectively suppresses the surface carrier trap and leakage current and makes the surface potential uniform. At the same time, amino groups affect the growth of perovskite films, resulting in higher crystallinity, phase purity, and fewer defects. In addition, open-circuit photovoltage attenuation analysis (OCVD) tests show that the ion aggregation phenomenon of the device is weakened and ion migration is inhibited. TPC indicates a shortened recovery time constant, which may be due to reduced band bending at the interface, resulting in increased mobility of electron injection energy barriers. As a result, the PCE increased from 18.95 to 20.47% while exhibiting excellent stability.

Graphical abstract: Dual-anchor interface engineering with a phosphonic acid modifier for improving perovskite solar cell performance

Supplementary files

Article information

Article type
Paper
Submitted
24 Mar 2025
Accepted
15 Jul 2025
First published
16 Jul 2025

Phys. Chem. Chem. Phys., 2025, Advance Article

Dual-anchor interface engineering with a phosphonic acid modifier for improving perovskite solar cell performance

W. Yao, Z. Qiao, Z. Chen, J. Wang and C. Mu, Phys. Chem. Chem. Phys., 2025, Advance Article , DOI: 10.1039/D5CP01135C

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