Design and analysis of a vertically extended gate field effect transistor (VEG-FET)-based hydrogen gas sensor: a comprehensive modeling and simulation approach

Abstract

In this study, a novel vertically extended gate field effect transistor (VEG-FET)-based hydrogen (H2) gas sensor with a look-up-table (LUT) based modeling and simulation approach is presented. The gate area is extended vertically without affecting the intrinsic parameters to provide a larger area for the adsorption of H2 molecules without increasing the sensor footprint. The gate electrode was vertically extended by depositing platinum (Pt) over a channel created in Parylene-C polymer. An analytical model was constructed for the interaction of H2 gas with platinum (Pt) to determine the change in the work function (ΦM). The Pt work function lowered by 16% for input hydrogen gas pressure (PH2) of 0 to 0.5 torr. The Pt–H2 interaction information is passed to a technology computer-aided design (TCAD) tool for VEG-FET design and simulation. The drain current (IDS) of the VEG-FET varies from 150.7 mA without H2 gas to 310.3 mA at 0.5 torr hydrogen gas pressure at gate to source (VGS) and drain to source (VDS) voltage of 3 V. Both bioreaction and TCAD results are passed to Cadence Virtuoso for a complete gas sensor with read-out circuit simulation using the LUT method. A VEG-FET based common source amplifier with resistive load was designed and simulated, and the output voltage (Vout) varied by ∼40% for PH2 = 0.5 torr.

Graphical abstract: Design and analysis of a vertically extended gate field effect transistor (VEG-FET)-based hydrogen gas sensor: a comprehensive modeling and simulation approach

Article information

Article type
Paper
Submitted
27 oct. 2024
Accepted
06 janv. 2025
First published
07 janv. 2025

J. Mater. Chem. C, 2025, Advance Article

Design and analysis of a vertically extended gate field effect transistor (VEG-FET)-based hydrogen gas sensor: a comprehensive modeling and simulation approach

P. Martha, M. Kohli, R. Kumar and S. K. Behera, J. Mater. Chem. C, 2025, Advance Article , DOI: 10.1039/D4TC04574B

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