Role of pO2 and film microstructure on the memristive properties of La2NiO4+δ/LaNiO3−δ bilayers

Klaasjan Maas; Chloé Wulles; Jose Manuel Caicedo Roque; Belén Ballesteros; Valentin Lafarge; José Santiso; Mónica Burriel

doi:10.1039/D1TA10296F

You do not have JavaScript enabled. Please enable JavaScript to access the full features of the site or access our non-JavaScript page.

Role of pO₂ and film microstructure on the memristive properties of La₂NiO_4+δ/LaNiO_3−δ bilayers†

Klaasjan Maas,^a Chloé Wulles,^ab Jose Manuel Caicedo Roque,^b Belén Ballesteros,

^b Valentin Lafarge,^ab José Santiso

*^b and Mónica Burriel

*^a

Author affiliations

* Corresponding authors

^a Univ. Grenoble Alpes, CNRS, Grenoble INP, LMGP, 38000 Grenoble, France
E-mail: monica.burriel@grenoble-inp.fr

^b Catalan Institute of Nanoscience and Nanotechnology (ICN2), CSIC and the Barcelona Institute of Science and Technology (BIST), Campus UAB, 08193 Bellaterra, Barcelona, Spain
E-mail: jose.santiso@icn2.cat

Abstract

LaNiO₃/La₂NiO₄ bilayers deposited at varying pO₂ conditions resulted in remarkable differences in film microstructure and cell parameters, directly affecting the electrical behaviour of Pt/LaNiO₃/La₂NiO₄/Pt devices. The devices deposited at low pO₂ showed the largest memristance. We propose this is due to the formation of a p-type Schottky contact between LaNiO₃ and La₂NiO₄, where the extent of its carrier depletion width can be modulated by the electric-field induced drift of interstitial oxygen ions acting as mobile acceptor dopants in La₂NiO₄.

This article is part of the themed collection: Special issue in honour of Prof. John Kilner’s 75th birthday

Download options Please wait...

Supplementary files

Supplementary information PDF (619K)

Article information

DOI: https://doi.org/10.1039/D1TA10296F
Article type: Paper
Submitted: 01 des. 2021
Accepted: 29 jan. 2022
First published: 02 feb. 2022
This article is Open Access

Download Citation

J. Mater. Chem. A, 2022,10, 6523-6530

Permissions

Request permissions

Role of pO₂ and film microstructure on the memristive properties of La₂NiO_4+δ/LaNiO_3−δ bilayers

K. Maas, C. Wulles, J. M. Caicedo Roque, B. Ballesteros, V. Lafarge, J. Santiso and M. Burriel, J. Mater. Chem. A, 2022, 10, 6523 DOI: 10.1039/D1TA10296F

This article is licensed under a Creative Commons Attribution-NonCommercial 3.0 Unported Licence. You can use material from this article in other publications, without requesting further permission from the RSC, provided that the correct acknowledgement is given and it is not used for commercial purposes.

To request permission to reproduce material from this article in a commercial publication, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party commercial publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Social activity

Fetching data from CrossRef.
This may take some time to load.

Journal of Materials Chemistry A