Influence of Anchoring Group on Charge Transport across Self-Assembled Monolayer-Based Molecular Tunnel Junctions

Abstract

Predicting the charge transport rate, mechanism and the dielectric response of solid-state molecular electronics is challenging since these properties depend on many variables such as molecular backbone, electrode material, junction contact geometry, anchoring and terminal functional groups, and so on. Although the effects of anchoring group (X) on the conductance of single-molecule junctions have been widely investigated, in large-area junctions examples are rare although the latter makes it possible to also explore the role of dielectric properties on charge transport rates. Here we report a change of 2.5 orders of magnitude in the charge transport rate along with a factor of 3 change in the measured dielectric constant (ɛr) across monolayers of X(C6H4)nH with n=1 or 2 and X=-NO2, -SH, -NH2, -CN, and -Pyr. Our combined study involving current-voltage measurements and impedance spectroscopy allowed us to isolate the contact (RC) and monolayer resistance (RSAM), and found that the RC increased with the X order. This change in RC goes hand-in-hand with the shift of HOMO and LUMO energy levels with respect to the Fermi levels of the electrodes explaining the large observed change in charge transport rates. Surprisingly, the increase in tunneling rates (or decrease in RSAM) scales with ɛr. Our work provides new insights into the factors that influence the charge transport rates and dielectric responses of molecular junctions besides widely studied changes to the molecular backbone or terminal functional groups.

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Article information

Article type
Communication
Submitted
15 May 2025
Accepted
28 Jul 2025
First published
30 Jul 2025
This article is Open Access
Creative Commons BY license

Nanoscale Horiz., 2025, Accepted Manuscript

Influence of Anchoring Group on Charge Transport across Self-Assembled Monolayer-Based Molecular Tunnel Junctions

Q. Guo, S. Huang, X. Yu, C. A. Nijhuis and X. Chen, Nanoscale Horiz., 2025, Accepted Manuscript , DOI: 10.1039/D5NH00347D

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