Issue 37, 2022

High-quality diamond microparticles containing SiV centers grown by chemical vapor deposition with preselected seeds

Abstract

The superior properties of diamond have made it a versatile platform for many promising applications in a wide range of areas. Thus, various methods, like chemical vapor deposition (CVD), have been developed to fabricate diamond materials with desired properties. However, the CVD-grown diamond that employs conventional detonation nanodiamonds (DNDs) as seeds is not suitable for many demanding applications that require diamond with high crystallinity, stable color centers, highly emissive features, etc. Here, we propose to use our previously developed salt-assisted air-oxidized (SAAO) nanodiamonds (NDs) as CVD seeds to grow high-quality diamond microparticles that contain silicon vacancy (SiV) centers. The resulting SiV centers hosted in diamond microparticles show superior properties, i.e., significantly increased photoluminescence (PL), narrow PL linewidths, and small inhomogeneous distributions, enabling a wide range of practical applications. We further demonstrate ultrasensitive all-optical thermometry measurement by utilizing the fabricated high-quality microparticle sample.

Graphical abstract: High-quality diamond microparticles containing SiV centers grown by chemical vapor deposition with preselected seeds

Supplementary files

Article information

Article type
Communication
Submitted
17 Marts 2022
Accepted
14 Jūn. 2022
First published
14 Jūn. 2022

J. Mater. Chem. C, 2022,10, 13734-13740

High-quality diamond microparticles containing SiV centers grown by chemical vapor deposition with preselected seeds

T. Zhang, M. Gupta, J. Jing, Z. Wang, X. Guo, Y. Zhu, Y. C. Yiu, T. K.C. Hui, Q. Wang, K. H. Li and Z. Chu, J. Mater. Chem. C, 2022, 10, 13734 DOI: 10.1039/D2TC01090A

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements