Issue 9, 2023

Graphene oxide degradation by a white-rot fungus occurs in spite of lignin peroxidase inhibition

Abstract

This study investigated the degradation of graphene oxide (GO) by the white-rot fungus Phanerochaete chrysosporium. Axenic fungal suspensions were inoculated in malt extract glucose medium enriched with various concentrations of GO and allowed to grow for several months. Biomass, pH, H2O2 content and activity of laccase (Lac) and lignin peroxidase (LiP) in the culture media were monitored, along with the physicochemical changes of GO over time followed by TEM, Raman, XPS and TGA. Lower concentrations of GO exhibited a stronger stimulating effect on P. chrysosporium growth and the production of Lac and H2O2 compared to higher concentrations, probably due to an excessive parallel increase in GO degradation by-products. The fungus significantly altered the structure of GO, with increase in the Raman D band, although GO neutralized LiP activity, possibly by unspecific adsorption. The activity of isolated LiP, but not of Lac, was suppressed in the presence of GO. Moreover, Lac caused modifications in the GO lattice as evidenced by a significant increase in the ratio between the intensity of the D and G bands of the Raman spectra. This enzyme emerges as a key player in the biodegradation of GRMs within terrestrial ecosystems, as its release extends beyond fungi to several other microorganisms.

Graphical abstract: Graphene oxide degradation by a white-rot fungus occurs in spite of lignin peroxidase inhibition

Supplementary files

Article information

Article type
Paper
Submitted
03 Febr. 2023
Accepted
02 Jūl. 2023
First published
21 Jūl. 2023
This article is Open Access
Creative Commons BY-NC license

Environ. Sci.: Nano, 2023,10, 2286-2298

Graphene oxide degradation by a white-rot fungus occurs in spite of lignin peroxidase inhibition

L. Fortuna, M. Garrido, H. Castillo-Gonzalez, D. Zanelli, C. Martín, F. Candotto Carniel, E. Vázquez, M. Prato, A. Bianco and M. Tretiach, Environ. Sci.: Nano, 2023, 10, 2286 DOI: 10.1039/D3EN00072A

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