Abstract
In this work, the insertion of CS2 into the Ge–Si bond of PhC(NtBu)2Ge–Si(SiMe3)3 (1) has been investigated, resulting in the formation of PhC(NtBu)2Ge–C(S)–S–Si(SiMe3)3 (2). Interestingly, the addition of NHC to 2 allows the release of NHC·CS2 with concomitant regeneration of 1. Addition of another equivalent of 1 or an analogous hypersilyl silylene, [PhC(NtBu)2Si–Si(SiMe3)3], to 2 led to the formation of compounds with a GeS (3) or a SiS (4) bond.
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