Issue 2, 2024

A new metallization method of modified tannic acid photoresist patterning

Abstract

Metal patterning from a modified tannic acid (TA-Boc-MA) photoresist and the processes are designed using protection of hydroxyl groups in tannic acid, formulation into a photoresist, an exposure and pattern treatment process, and metallization by electroless Ag deposition with silver ion solution.

Keywords: Tannic acid; Positive photoresist; Metallization method; Metal patterning; Ag pattern.

Graphical abstract: A new metallization method of modified tannic acid photoresist patterning

Supplementary files

Article information

Article type
Communication
Submitted
26 Jūn. 2023
Accepted
14 Aug. 2023
First published
15 Aug. 2023
This article is Open Access
Creative Commons BY license

Ind. Chem. Mater., 2024,2, 284-288

A new metallization method of modified tannic acid photoresist patterning

Z. Tang, X. Guo, H. Wang, H. Chen and W. Kang, Ind. Chem. Mater., 2024, 2, 284 DOI: 10.1039/D3IM00066D

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