Interfacial chemical bond engineering on Te semiconductor to weaken carrier-phonon coupling for boosting thermoelectric conversion performance
Abstract
The thermoelectric performance of Te-based semiconductors can be boosted utilizing interfacial chemical-bonding heterogeneity without doping matrix lattice. The resulting dual p-p type heterointerfaces through introducing metavalently bonded Bi2Te3 and covalently bonded B into Te, enable the obvious carrier-phonon decoupling.
- This article is part of the themed collection: Chemistry at the Forefront of the Sustainable Energy Transition