Interfacial chemical bond engineering on Te semiconductor to weaken carrier-phonon coupling for boosting thermoelectric conversion performance

Abstract

The thermoelectric performance of Te-based semiconductors can be boosted utilizing interfacial chemical-bonding heterogeneity without doping matrix lattice. The resulting dual p-p type heterointerfaces through introducing metavalently bonded Bi2Te3 and covalently bonded B into Te, enable the obvious carrier-phonon decoupling.

Supplementary files

Article information

Article type
Communication
Submitted
19 mei 2025
Accepted
16 jun 2025
First published
16 jun 2025

Chem. Commun., 2025, Accepted Manuscript

Interfacial chemical bond engineering on Te semiconductor to weaken carrier-phonon coupling for boosting thermoelectric conversion performance

D. An, M. Liu, Z. Si, W. Yue, W. Yang and X. Zhang, Chem. Commun., 2025, Accepted Manuscript , DOI: 10.1039/D5CC02836A

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