Issue 2, 2001
From the journal:

Lab on a Chip

Elemental fluorine

Part 13.† Gas–liquid thin film microreactors for selective direct fluorination

Richard D. Chambers,*a   Darren Holling,a   Robert C. H. Spinka  and  Graham Sandford*a  

* Corresponding authors

a Department of Chemistry, University of Durham, South Road, Durham, UK
E-mail: r.d.chambers@durham.ac.uk; graham.sandford@durham.ac.uk

Abstract

Continuous flow gas–liquid thin film microreactors have been effectively used for the selective fluorination of a range of 1,3-dicarbonyl and aromatic substrates and, additionally, the conversion of aromatic disulfides to the corresponding sulfur pentafluorides. Scale-up was demonstrated by the application of a three channel microreactor device fabricated by replication of a single channel system.

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Article information

DOI
https://doi.org/10.1039/B108841F
Article type
Paper
Submitted
29 Sep 2001
Accepted
23 Oct 2001
First published
13 Nov 2001

Lab Chip, 2001,1, 132-137

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Elemental fluorine

R. D. Chambers, D. Holling, R. C. H. Spink and G. Sandford, Lab Chip, 2001, 1, 132 DOI: 10.1039/B108841F

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