Issue 61, 2014
From the journal:

Chemical Communications

A novel method for photolithographic polymer shadow masking: toward high-resolution high-performance top-contact organic field effect transistors†

Deyang Ji,‡ab   Longfeng Jiang,‡c   Lang Jiang,*a   Xiaolong Fu,ab   Huanli Dong,a   Junsheng Yu*c  and  Wenping Hu*a  

* Corresponding authors

a Beijing National Laboratory for Molecular Science, Key Laboratory of Organic Solids, Institute of Chemistry, Chinese Academy of Sciences, Beijing 100190, China
E-mail: huwp@iccas.ac.cn, ljiang@iccas.ac.cn

b Graduate School of the Chinese Academy of Sciences, Beijing 100190, China

c State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Optoelectronic Information, University of Electronic Science and Technology of China (UESTC), Chengdu 610054, China
E-mail: jsyu@uestc.edu.cn

Abstract

A novel and universal method, based on water-soluble poly(4-styrene sulfonate), was introduced into the preparation of a polymer mask. Using this mask, high-resolution, high-performance, bottom-gate, top-contact OFETs can be achieved. There is no solvent intervention in the process of manufacturing these OFETs and the mask can be recycled.

Graphical abstract: A novel method for photolithographic polymer shadow masking: toward high-resolution high-performance top-contact organic field effect transistors

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Article information

DOI
https://doi.org/10.1039/C4CC01932F
Article type
Communication
Submitted
15 Mar 2014
Accepted
30 Apr 2014
First published
02 May 2014

Chem. Commun., 2014,50, 8328-8330

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A novel method for photolithographic polymer shadow masking: toward high-resolution high-performance top-contact organic field effect transistors

D. Ji, L. Jiang, L. Jiang, X. Fu, H. Dong, J. Yu and W. Hu, Chem. Commun., 2014, 50, 8328 DOI: 10.1039/C4CC01932F

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