Issue 2, 2019, Issue in Progress

Facile organic surfactant removal of various dimensionality nanomaterials using low-temperature photochemical treatment

Abstract

Deep ultraviolet (DUV)-treatment is an efficient method for the removal of high-energy-barrier polymeric or aliphatic organic ligands from nanomaterials. Regardless of morphology and material, the treatment can be used for nanoparticles, nanowires, and even nanosheets. The high-energy photon irradiation from low-pressure mercury lamps or radio frequency (RF) discharge excimer lamps could enhance the electrical conductivity of various nanomaterial matrixes, such as Ag nanoparticles, Bi2Se3 nanosheets, and Ag nanowires, with the aliphatic alkyl chained ligand (oleylamine; OAm) and polymeric ligand (polyvinyl pyrrolidone; PVP) as surfactants. In particular, Ag nanoparticles (AgNPs) that are DUV-treated with polyvinyl pyrrolidone (PVP) for 90 min (50–60 °C) exhibited a sheet resistance of 0.54 Ω □−1, while thermal-treated AgNP with PVP had a sheet resistance of 7.5 kΩ □−1 at 60 °C. The simple photochemical treatment on various dimensionality nanomaterials will be an efficient sintering method for flexible devices and wearable devices with solution-processed nanomaterials.

Graphical abstract: Facile organic surfactant removal of various dimensionality nanomaterials using low-temperature photochemical treatment

Supplementary files

Article information

Article type
Paper
Submitted
02 Oct 2018
Accepted
12 Dec 2018
First published
04 Jan 2019
This article is Open Access
Creative Commons BY-NC license

RSC Adv., 2019,9, 730-737

Facile organic surfactant removal of various dimensionality nanomaterials using low-temperature photochemical treatment

C. Hwang, J. S. Heo, K. Kim, Y. K. Kang, B. Choi, Y. Kim, A. Facchetti, S. K. Park and M. Kim, RSC Adv., 2019, 9, 730 DOI: 10.1039/C8RA08173E

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