Zenan Jiang*a,
Saeid Soltaniana,
Bobak Gholamkhassa,
Abdullah Aljaafarib and
Peyman Servatia
aDepartment of Electrical and Computer Engineering, University of British Columbia, 2332 Main Mall, Vancouver, BC, Canada V6T 1Z4. E-mail: jiang@ece.ubc.ca
bCollege of Engineering, King Faisal University, Al-Hasa 31982, P. O. Box 400, Saudi Arabia
First published on 30th October 2018
This paper investigates light-soaking effects in inverted organic photovoltaic (OPV) devices with zinc oxide (ZnO) and aluminum doped ZnO (AZO) electron transport layers (ETL), which is important for the development of low-cost and stable solar cells. The samples demonstrated high solar harvesting properties with power conversion efficiency up to 3.9%. Air-stability tests of up to 150 days were performed on devices with different Al doping levels. The devices maintained higher than 60% of the initial PCE after 50 days of open-air exposure. The light-soaking mechanism was investigated with experiments and simulations and shown to be eliminated when the Al fraction of the AZO is higher than 4%. The simulated band diagram of the OPV devices indicates that the low carrier density in the ZnO layer by virtue of depletion is the main reason of the light-soaking effect. Doping the ZnO layer as well as exposing the devices under UV irradiation will introduce additional free carriers into the ETL and reduce the width of the depletion region at both sides of the ETL.
Normal OPV devices use transparent indium–tin oxide (ITO) electrodes as the cathode and organic poly(3,4-ethylenedioxythiophene)-polystyrene sulfonate (PEDOT:PSS) as the anode buffer layer. However, PEDOT:PSS is corrosive to ITO due to its acidic nature and may decompose under long-term UV exposure.2,3 Therefore, OPV devices with normal structure are not ideal for robust long-term solar energy harvesting. Moreover, high work function metals that are used as cathode interfacial layer are sensitive to oxygen and humidity in the surrounding atmosphere. Thorough encapsulation and packaging become necessary to stop these devices from fast degradation.
On the other hand, OPV devices with an inverted structure are able to avoid the incorporation of unstable materials and have long-term stability. Inverted polymer solar cells with PCE of over 9% (ref. 4) has been reported. Metal oxide materials, e.g., ZnO and TiOx, are commonly used as an electron transport layer (ETL) deposited on the transparent electrode for inverted OPV devices.5–7 Among all the metal oxides, zinc oxide (ZnO) stands out for its high electron mobility, high visible transparency, low cost, and environmentally friendly nature. ZnO nanoparticles can be synthesized using low-cost solution processing methods that make it compatible with the large area printing or roll-to-roll manufacturing.
One typical phenomenon that appears in solar devices using metal oxide ETLs is the so-called “light-soaking” effect, which refers to the improvement of device PCE under solar illumination over time. The performance of PV devices gradually increases with the increasing exposure time, and eventually reaches a maximum. The light-soaking effect poses as a major issue when solar cells experience variation in environmental illumination. Such effect directly leads to a fluctuation in the output power and requires additional stabilizing electronics. Several hypothesis have been made to explain such behavior, including the energy barrier between the ETL and active organic layer blocks electron transport,8 oxygen absorption on the metal oxide surface creates deep level defects,9 and excess carriers tunnel through interface levels between metal oxide layer and phenyl-C61-butyric acid methyl ester (PCBM) layers,10 etc. Currently, the origin of the effect is still not clear. It has been reported that the light-soaking effect can be overcome by employing Atomic Layer Deposition (ALD) of aluminum doped ZnO (AZO) as ETL,8 or by UV exposure11 of the solar cells for a certain period of time. Nonetheless, UV irradiation causes degradation of the active polymers with the soaking effect reappearing after storing the devices in the dark. In comparison, Al doped ZnO can be readily synthesized using low cost solution processes, which is more suitable for manufacturing of light-soaking free devices.
In this work, we report the photovoltaic characteristics of inverted OPV devices fabricated with AlxZn(1−x)O as ETL with Al fraction of up to 11%. Light-soaking effect can be eliminated by using more than 4% of Al doping. All the OPV devices demonstrate PCE over 3.4% with air-stability of over 150 days. The suppression of light soaking effect by Al-doping is demonstrated at various Al fractions. The light-soaking mechanism is investigated by employing a numerical simulation on the devices.
For the morphology studies, a single layer of ZnO/AZO nanoparticles was spin-coated on ITO-coated glass (20 ohm per sqr) substrates at 3000 rpm for 10 seconds followed by thermal treatment up to 250–320 °C for 5 minutes depending on the concentration of Al. The thickness of the nanoparticle layer is about 25 nm.
For optical absorption measurements, the precursor inks were spin-coated on glass slides with the same conditions. The coating was repeated three times, resulting in an about 75 nm thick layer for each sample.
The structure and the alignment of the highest occupied molecular orbital (HOMO) and lowest unoccupied molecular orbital (LUMO) energy levels for the inverted OPV devices are schematically depicted in Fig. 1.6 ZnO/AZO layer with the thickness of ∼75 nm were deposited on ITO substrates, by repeating the spin-coating and annealing process three times with the same conditions. The triple-time coating leads to a pinhole-free nanoparticle layers.6 The bulk heterojunction films were deposited from a 1:1 solution of [6,6]-phenyl C61 butyric acid methyl ester (PC61BM) and poly(3-hexylthiophene-2,5-diyl) (P3HT, regioregularity 95%, Solaris Chem Inc.) in 1,2-dichlorobenzene (1,2-DCB; 99%, Sigma-Aldrich) with the concentration of 40 mg ml−1. The blend ink was sequentially spin-cast on the nanoparticle layers at the rates of 250 rpm (3 s), 1000 rpm (15 s) and 1500 rpm (3 s), resulting in a 200 nm thick layer. The films were placed in a covered Petri dish immediately after coating in order to control the solvent evaporation rate (drying time: 10–20 min). Finally, MoO3 (8 nm) and Ag (120 nm) were thermally deposited (at a vacuum level of 2 × 10−8 torr) through a shadow mask to complete the PV device. The overlapped area of the top and bottom electrodes defines an active device area of 0.2 cm2. No encapsulation was performed after the deposition of the top contact.
Fig. 1 The energy level alignment (a) and device structure (b) in an inverted OPV using P3HT:PC61BM (1:1). |
Current density–voltage (J–V) measurements of devices were conducted on a computer-controlled Keithley 2400 Source Meter. A xenon lamp (150 W, Newport Co.) equipped with an AM 1.5G filter was used as the light source. The optical power was 100 mW cm−2, calibrated using a broadband power meter (Newport Co.). The external quantum efficiency (EQE) was measured using monochromatic light (Cornerstone 130 Monochromator, Newport Co.). The incident power was measured using a power/energy meter (Newport Co.). Scanning electron microscopic (SEM) and atomic force microscope (AFM) images were recorded using Zeiss Sigma FE-SEM and Asylum Research MFP 3D respectively. Film thickness was measured with a Bruker Dektak XT profilometer. Absorption spectra were measured using a Varian Cary 7000 spectrometer.
The Al composition was studied with EDX. The amount of Al dopants detected in the samples shows a linear relation with the doping concentration, as shown in Fig. 2(c) and (d). The intensity of the Al Kα peak detected in the films increases linearly with the molar ratio of Al ions added to the precursor ink, which indicates the proportional incorporation of Al in the film.
Sample | Al fraction in ETL [%] | JSC [mA cm−2] | VOC [V] | FF [%] | PCE [%] |
---|---|---|---|---|---|
ZnO | 0 | 12.0 | 0.57 | 51.3 | 3.5 |
A1 | 1.0 | 12.0 | 0.57 | 53.5 | 3.7 |
A2 | 2.0 | 12.1 | 0.56 | 53.3 | 3.6 |
A4 | 4.0 | 12.3 | 0.57 | 56.0 | 3.9 |
A6 | 5.5 | 12.0 | 0.57 | 53.5 | 3.6 |
A7 | 7.5 | 12.0 | 0.57 | 52.5 | 3.6 |
A9 | 9.0 | 11.9 | 0.57 | 51.6 | 3.5 |
A11 | 11 | 11.7 | 0.56 | 51.9 | 3.4 |
Annealing temperature of the ETL layers is a key factor for fabrication of solar cells with high performance. It has been observed that devices with ZnO ETL show highest PCE when the ZnO was annealed at 250 °C. To reach the same performance, the annealing temperature has to increase for devices with Al-doped NPs ETL. With 1–2% of Al doping, the best conductivity and carrier transfer properties were achieved by rising annealing temperature to 290 °C. For Al fraction higher than 2%, annealing temperature at 320 °C is required to achieve optimum electrical properties. The result is consistent with our previous observation regarding the reduction in size of nanocrystals due to Al doping. The formation of ZnO nanoparticles requires higher energy to incorporate Al impurities into the unit cells and to form uniform film with high conductivity and mobility.15,16
External quantum efficiency (EQE) is defined as the ratio of the number of incident photons and the number of output electrons. It demonstrates the ability of light absorption and charge collection of the solar cells at the same time. Fig. 3(b) shows the EQE curves of the OPV devices from 400 to 800 nm. It is evident that a relative enhancement of EQE at 600 nm occurred for all the Al-doped samples. Similar phenomenon has been reported before.17 As the particle sizes are reduced with Al doping, the surface morphology of AZO layers is likely to be improved in comparison to the ZnO film. Al dopants also introduce electrical polarization into the ZnO lattice, which is likely to influence the wettability. When the P3HT:PCBM ink was spin cast on the ETL, an improvement of ordering could occur during the crystallization of P3HT, and subsequently enhance the quantum efficiency.18
In addition to the tests on the as-fabricated devices, long-term stability tests have also been carried out. All the OPV devices were exposed to air at room temperature for over 5 months. J–V measurements were performed periodically during this time. Fig. 3(c) illustrates the J–V properties measured at the day of fabrication and 150 days later of sample A4 which has 4% Al doped ZnO as ETL. After exposure to ambient environment for 5 months, the Voc and Jsc of the device were nearly unchanged, while the maximum output power decreased by ∼32% (PCE from 3.4% to 2.4%) due to the reduction of FF. Fig. 3(d) illustrates the normalized PCE of a device with ZnO ETL within the first 50 days of air exposure as an example. In contrast to conventional OPV devices, the PCE of our devices first increased for 3–6 days, followed by gradual decline and eventually plateaued at ∼60% of the maximum value. The PCE of devices with Al incorporation show similar enhancing-declining trend as well. The mechanism behind the increasing of PCE in the beginning stage is still under debate, as air and humidity exposure usually causes damages to conventional OPV devices. However, similar phenomenon has been reported for P3HT solar cells with TiOx ETL.19 One possible explanation is that the P3HT molecules are doped with oxygen when exposing to air, and the hole concentration is increased.20 The interfacial electrostatic force between the electron donor and acceptor layers is increased, resulting in a higher efficiency of exciton dissociation and therefore a rising PCE.
In order to understand the light-soaking mechanism, the UV-Visible absorption measurements were performed on glass samples coated with similar ZnO and AZO films to investigate the shifting of the bandgap with Al doping. Each sample was coated with 75 ± 5 nm thick ZnO/AZO particles. The samples were cured in air at 250 °C for ZnO, 290 °C for AZO with 1% Al, and 320 °C for samples with Al concentration > 1%. The absorption spectra (Fig. S3 in ESI†) reveals above 90% transmittance over 400 nm to 800 nm on all the ZnO and AZO thin layers. The optical bandgap is extrapolated from a linear fit to the plot of the squared absorption coefficients vs. photon energy. As shown in Fig. 5(a), the optical bandgap increases with higher Al molar ratio of the NPs. The bandgap shifting is consistent with the well-known Moss–Burstein effect21,22 in which the absorption edge of a semiconductor is pushed to higher energies when charge carriers populate states close to the conduction band. The carrier concentration is increased with more Al incorporation, pushing the Fermi level closer to or even above the original conduction band of ZnO films. Assuming the conduction and valence bands of AZO are parabolic, the bandgap shifting ΔEg and the carrier densities ne follow the relationship:
(1) |
A numerical simulation based on a modified hetero-PN-junction model was established to calculate the band bending of the inverted OPV devices at 0 V bias. The HOMO and LUMO levels of each layers were obtained from ref. 6, 24 and 25. The carrier concentration of the polymer layers are extracted from the saturated short-circuit current of sample ZnO and A4, while the free electron concentration of ZnO and A4 are obtained from ref. 23 and 26. The thickness of each layer is assumed to be the same as shown in Fig. 1(b), while P3HT and PCBM layers each takes half of the BHJ thickness.
Trost et al. believes that by shifting the Fermi level closer to the conduction band, the pre-existing mismatch between the conduction band of PCBM and ZnO would be reversed for PCBM and AZO interfaces.8 In addition, the opposite interface dipoles could lead to the transport of the generated electrons to the AZO side. However, as the conduction band of ZnO and AZO remains at the same energy, shifting of the Fermi level will only bend the conduction band of both layers, as illustrated in Fig. 5(b). The interfacial dipoles will remain in the same direction, as the barrier is the same as it without Al doping.
As shown in Fig. 5(b), the interface between ITO and ZnO/AZO should be considered as a Schottky contact instead of an ohmic contact since there is a 0.4 eV mismatch between the conduction band of ZnO/AZO and the work function of ITO. When the free carrier density is low in the ETL, the entire layer is depleted to create enough bending on the conduction band to match with the adjacent PCBM and ITO layers. The generated electrons are then swept back to the BHJ and recombined with the generated holes, causing a low charge collection rate. When Al dopant is introduced into the ZnO lattice, the free carrier density in the ETL layer is increased and the depletion region on both sides of the AZO layer is reduced. Eventually when the depletion region is narrow enough to allow the generated electrons tunneling through the barriers, the J–V curves of the devices saturate and the light-soaking effect is fully eliminated. UV exposure, which injects photons with higher energy than the bandgap of ZnO, would excite bonded electrons in the ZnO to the conduction band and increasing the carrier density. Henceforth, the OPV devices will show saturation after a certain exposure time. Once the UV light is removed, the carrier density in ZnO decreases and the layer is again depleted and blocking electron transport.
Footnote |
† Electronic supplementary information (ESI) available. See DOI: 10.1039/c8ra07071g |
This journal is © The Royal Society of Chemistry 2018 |