Xiaoli Dai†
a,
Ming Zhang†a,
Jitao Li*b and
Dingyu Yang*a
aCollege of Optoelectronic Technology, Chengdu University of Information Technology, Chengdu 610225, China. E-mail: jtlee@tju.edu.cn
bSchool of Precision Instruments and Optoelectronics Engineering, Tianjin University, Tianjin, 300072, China. E-mail: yangdingyu@cuit.edu.cn
First published on 21st April 2020
As is well known that the specific capacitance of supercapacitors cannot be improved by increasing the mass of the deposited MnO2 films, which means an appropriate deposition duration is important. In this study, nanobelt-structured MnO2 films were prepared by the electrochemical deposition method under different deposition time to explore the effects of electrodeposition time change on the microstructure and electrochemical properties of this material. Benefiting from the microstructure of the MnO2 films, the transfer properties of the charged electrons and ions were promoted. Meanwhile, a 3D porous nickel foam was chosen as the deposition substrate, which rendered an enhancement of the MnO2 conductivity and the mass of the active material. The enhanced specific capacitance and specific surface area attributed to synergistic reactions. Subsequently, the electrochemical performances of the as-prepared materials were analyzed via cyclic voltammetry (CV), galvanostatic charge–discharge (GCD) and electrochemical impedance spectroscopy (EIS) tests. Results show that the optimum sample deposited for 50 s has a specific capacitance of 291.9 F g−1 at the current density of 1 A g−1 and lowest Rct. However, its electrochemical stability cannot come up to the level of the 300 s sample due to the microstructure change.
In general, supercapacitors can be classified into two categories depending on the mechanism of energy storage – pseudocapacitors (PCs) and electric double-layer capacitors (EDLCs). However, EDLCs always show much lower specific capacitance and energy density than PCs owing to the fact that EDLCs mainly rely on the charge storage on the interface between the electrode material and the electrolyte ions.9–11 However, PCs depend on the rapid and reversible faradaic reactions that occur on the surface of the electrode material.12,13 The key to pseudocapacitors is the preparation of electrode materials. Transition metal oxides are commonly used as pseudo-capacitive materials. An electrode of hydrous RuO2 nanoparticles dispersed on the Co3O4 nanosheets with an excellent specific capacitance of 905 F g−1 at 1 A g−1 was obtained.14 However, as an electrode material, RuO2 cannot be widely used due to its high cost and rarity. In recent years, tremendous efforts have been devoted to studies on MnO2 due to its low cost, abundant natural reserve, wide potential window15,16 and green non-polluting characteristics. That shows researchers the possibility of replacing RuO2 with MnO2. However, MnO2 cannot satisfy large-scale commercial applications due to its poor conductivity17,18 and small specific surface area.19 Therefore, numerous approaches are undertaken to improve the specific capacitance of MnO2 as an electrode, such as forming a composite electrode with conductive substrates,20,21 making atomic defects22,23 and modifications.24,25 Besides, among the various methods of synthesizing MnO2, electrochemical deposition is considered to be the simplest and relatively rapid preparation method. Moreover, it is suitable for preparing nanomaterials and MnO2 with nanostructures greatly shortens the diffusion path of the electrolyte ions during the process of charging and discharging, which can effectively improve the specific capacitance of supercapacitors.26 S. S. Xiong et al. just used the MOF structure to obtain good results according to this principle.27 For instance, a granular MnO2/graphene composite was obtained via the electrochemical deposition. The specific capacitance of the best performing composite is 378 F g−1 at a scan rate of 1 mV s−1.28 Also, a flowery MnO2/graphene complex was prepared using GO and MnSO4 as the raw material via electrochemical deposition, and in a three-electrode system, the specific capacitance can reach 595.7 F g−1 at the current density of 1 A g−1.29 Previously, MnO2 with different microstructures has been successfully prepared and tested,30–35 and the results show that different structures of the same materials demonstrate different electrochemical properties. Zhu et al.36 reported a core branch heterostructure nano array of α-MnO2 nanowires and β-MnO2 ultra-thin nanosheets that combined the mass load of the active substance with enhanced pseudocapacitance. It can be seen that the performance of the material is greatly affected by the appearance of the surface, so it is very meaningful to study the microstructure of the material.
The microstructure and surface morphology of the materials are important factors affecting the properties of the material. Therefore, in this study, the changing trend of the morphology and microstructure of manganese dioxide electrode materials with time is studied. In the three-electrode system, electrochemical deposition at a constant voltage of 0.6 V is used to prepare films with different deposition time. Finally, the obtained samples were systematically tested and analyzed to decide a more appropriate deposition time. Moreover, it also contributed in laying the foundation for the subsequent improvement of experiments and the preparation of capacitors with better performance.
The main reaction of MnO2 during charge and discharge is
MnO2 + Na+ + e− = MnOONa | (1) |
The mass specific capacitance of the material is calculated based on the GCD curve using the following formula:
(2) |
The area specific capacitance of the material is calculated via cyclic voltammetry (CV) using the following equation:
(3) |
Fig. 1 (a and b) TEM images with different magnifications; (c and d) HR-TEM images of the nanobelts of the 50 s sample. |
In order to investigate the oxidation states of manganese, samples were observed via X-ray photoelectron spectroscopy (XPS). Based on Fig. 2(a), two prominent peaks appeared in the Mn 2p orbit. The value of Mn 2p3/2 and Mn 2p1/2 represents Mn3+ and Mn4+, respectively. In general, the higher the chemical valence of the element Mn, the more favorable the chemical reaction is. Also, the separation value is 11.7 eV, and the result is consistent with the previous research.37 Results reveal that the element Mn is in the +4 valence state. As shown in Fig. 2(b), the O 1s spectrum was fitted, consisting mainly of two components, one is 529.7 eV (Mn–O–Mn) and the other is 531.6 eV (Mn–OH), which is in good agreement with the ref. 38–40. Hence, after comprehensive analysis, we could conclude that the deposited film is MnO2·nH2O.
The surface topography of the electrode was observed using a scanning electron microscope. As shown in Fig. 3(b), since the continuous three-dimensional porous foam nickel substrate provided a high specific surface area for the deposition of manganese dioxide, the MnO2 films were evenly deposited on the surface of the porous nickel foam. When the deposition time increased to 300 s, as shown in Fig. 3(c), it can be seen clearly that the film has a small area of cracks, which is caused by the excessive mass load of the deposited MnO2 and the weakened bonding of the film between the substrates as the duration was extended. When the deposition time was constantly increased to 500 s, as shown in Fig. 3(d), the fracture area was dramatically increased, indicating a sustained increase in the deposited MnO2.
As shown in Fig. 3(a), 4(a and f), the MnO2 film with a deposition time of 30 s has not grown completely yet. Thus, there are still numerous small areas of the exposed substrate. As shown in Fig. 4(b–e), MnO2 with a deposition time of 50 s and 150 s grew more uniformly and the film is more complete. The MnO2 film presents a structure of similar flocs when the deposition time is increased to 300 s. However, when the deposition time increased to 500 s, the growth of MnO2 tends to be spherical with a tendency to protrude and gather. From the higher magnified scanning electron images Fig. 4(f–j), it can be observed that the manganese dioxide film with a deposition time of 30 s has a porous structure consisting of many nano-branches, and the deposited MnO2 is a single-layer structure but incomplete. MnO2 with a deposition time of 50 s still grew uniformly and completely that formed a thin and porous structure. The utilization rate of MnO2 is higher with thin and porous structures due to the electrochemical reaction occurring mainly on the surface of the substance. MnO2 with a deposition time of 150 s grew more uniformly, but the film is denser. When the deposition time increased to 300 s, MnO2 exhibits a crystallization trend. Meanwhile, the crystal volume became larger, increasing the specific surface area. Nevertheless, compared with the increase in specific surface area, the reduction in porosity and the increase in thickness have a greater impact on the decrease in mass. When the deposition time increases to 500 s, MnO2 with the nano-branches structure has a convergence trend, and the crystal volume became smaller. Therefore, the porosity and the specific surface area are reduced, which is not conducive to the transfer of electrons and ions between the active material phase and the collector interface.
Fig. 4 SEM images of (a) 30 s, (b) 50 s, (c) 150 s, (d) 300 s, (e) 500 s, (f) 30 s, (g) 50 s, (h) 150 s, (i) 300 s, (j) 500 s deposition time, respectively. |
On the basis of SEM images with different deposition time, we can find the deposition regulation of manganese dioxide during the electrochemical deposition process. At a certain potential, MnO2 is oxidized from Mn(CH3COO)2 and deposits on the substrate. The initial formation of manganese dioxide grains is very small, as deposition time increases, the grains grow up and begin to accumulate closely. Gradually, a single layer is formed by joining the local planes, which grow and spread around the points on the surface of the substrate. Also, the continuous application of voltage keeps manganese dioxide growing on its original basis. Finally, when its volume reaches a certain value, its shape changes.
Fig. 5(b) shows a CV graph of different samples at a scan rate of 5 mV s−1. The CV curve shows the symmetrical curve shape of an approximate rectangle, indicating that the process is dynamically reversible. In addition, the electrode shows the pseudo capacitor characteristic of a pair of redox-reduced peaks, which is contributed by the fast and reversible reaction on the surface of the active substance. The area of the closed curve corresponding to the sample with a deposition time of 300 s is the largest, indicating that it has the maximum area specific capacitance. According to Fig. 5(c), it is obvious to see the changing trend of area specific capacitance. It happened because as the deposition time is getting longer, the mass of MnO2 deposited on the substrate is increasing. When the film thickness reached the maximum, the electrode material showed the largest area specific capacitance, whereas the area specific capacitance of the sample with the longest deposition time of 500 s is not comparable to the latter. It is possible that the changes in the microstructure of MnO2 have the opposite effect on the area specific capacitance. The results here can be explained by the SEM images.
Fig. 5(d) shows that the samples prepared by different deposition time vary in specific capacitance at different current densities. Both the deposition time and current density will affect the area specific capacitance and mass specific capacitance of the electrode. Through the figure, we can observe that the specific capacitance of the sample prepared for 50 s is the highest at any current density taken all the time. At the current density of 1 A g−1, 2 A g−1, 3 A g−1, 4 A g−1, and 5 A g−1, the specific capacitance is 291.9, 241.5, 212.8,1 92.9, and 177.9 F g−1, respectively. The reason why specific capacitance decreases with the increase in current is that active material cannot fully react at the high current density. When the deposition time is extended to 500 s, the specific capacitance is reduced to 151.5, 124.2, 116.1, 100.7, 90.2 F g−1 at a current density of 1 A g−1, 2 A g−1, 3 A g−1, 4 A g−1, and 5 A g−1, respectively. Although the film thickness increased, electrochemical reactions mainly occur on the surface of the active substance. The covered internal of the active substance cannot come into and react with the electrolyte thus being unable to contribute to the capacitance. Also, as the deposition time increases, the mass of active substance increases as well. Hence, the mass specific capacitance decreases with the increase in the deposition time. Also, the mass utilization ratio will certainly decrease.
The internal resistance of the capacitor has an extremely large effect on its electrochemical performance. If the internal resistance is small, the unnecessary heat generation during the charge and discharge process will be reduced. Fig. 5(e) presents the GCD curves at a current density of 1 A g−1 with MnO2 as the working electrode, which are distributed in a similar isosceles triangle, showing a high degree of reversibility and charge/discharge performance. It also suggests that the method of charge storage is adsorption/desorption in the electrode/electrolytic interface.41 The discharge curves of all the samples have a small voltage drop at the beginning of the output, which indicates a lower equivalent series resistance (ESR). Among all the samples, the charge–discharge performance of the samples with the deposition time of 50 s is obviously better than other samples with different deposition time. According to the GCD curve and formula (3) at a current density of 1 A g−1, the specific capacitance of the sample prepared for 30 s, 50 s, 150 s, 300 s, 500 s is calculated to be 258.4, 291.9, 225.2, 241.9, 151.5 F g−1, respectively. Compared with the CV results, it seems that we got contradictory results. However, the result calculated by the GCD method is the mass specific capacitance of the active material, while the result calculated by the CV method is the area specific capacitance of the material. Because the sample deposited in a shorter time (50 s) has less active material per unit area, it exhibits a lower area specific capacitance. The structure of the sample deposited in a short time is looser, which is conducive to the transport of electrons and ions and has a slightly smaller mass than the sample deposited for a long time. The performance of the samples with a deposition time of 30 s is inferior to that of 50 s. Here, although both of them are monolayer structures, the former deposition time is too short, which results in the insufficient quality of the deposited active material. With the extension of the deposition time, the quality of MnO2 deposited increased; the thickness of the film increased and the structure changed observably, and all the changes led to the insufficient utilization of the active material during the chemical reaction, thus its discharge time is shortened.
To further investigate the electrochemical properties of the electrode, the electrochemical impedance spectroscopy (EIS) was used to study the charge transfer dynamics and mechanisms of the supercapacitor electrode material, as shown in Fig. 6(a and b). Moreover, the equivalent circuit diagram in Fig. 6(b) is used to fit the impedance values of Rct. Obviously, as the frequency increases, the resistance R increases, and when the frequency decreases, the capacitance C strengthens. The electrochemical processes are mainly divided into dual capacitance processes and Faraday processes, which correspond to the Cdl (dual-layer capacitance) and Faraday impedance. In the high-frequency region, that is to say the arc curve, mainly charge transfer is carried out that results in Rct (charge transfer resistance). However, in the low-frequency region, mainly material transfer is carried out;36 it is shown as the approximate linear curve on the right side of the arc. The Warburg (Zw)42 impedance in this process is reflected by the slope of the curve. Furthermore, the approximate capacitance of the electrode can also be calculated by the data of the region. The electrode resistance is mainly composed of Rs (solution resistance) and Rct (charge transfer resistance). Rs is reflected by the intercept on the real axis in Fig. 6(b),42,43 including inherent resistance, ionic resistance and contact resistance of the active material to the current collector interface. The Rs of 30 s, 50 s, 150 s, 300 s and 500 s are 1.71, 1.81, 1.82, 1.80, and 1.86 Ω, respectively. The Rs of the samples with deposition time of 30 s is the lowest because the mass of the active substance is not enough to evenly distribute on the support. Besides, lower Rs also shows in the sample deposited for 50 s. While Rct can be reflected by the diameter of the semicircle in Fig. 6(b) and compared with other samples, the sample of 50 s has the smallest diameter revealing that this sample with the lowest Rct is favorable for electron and ion transport, more consistent with electrode mechanism.
Fig. 6 (a) Variation of impedance modulus with frequency; (b) electrochemical impedance spectroscopy; (c) equivalent model of the fitting circuit. |
Footnote |
† Author have equal contribution to this work. |
This journal is © The Royal Society of Chemistry 2020 |