A two-step gas/liquid strategy for the production of N-doped defect-rich transition metal dichalcogenide nanosheets and their antibacterial applications

Abstract

Herein, we developed a general two-step gas expansion and exfoliation strategy based on a urea-assisted hydrothermal process combined with sonication exfoliation for the production of nitrogen (N)-doped plus defect-rich transition metal dichalcogenide (TMD) nanosheets (NSs) such as N–MoS₂ and N–WS₂ NSs. The interlayers of bulk MoS₂ (or WS₂) were expanded with urea molecules dissolved in distilled water, which were decomposed to NH₃ during the hydrothermal process. Simultaneously, sulfur atoms were partly replaced by N atoms to achieve N doping. Subsequently, sonication exfoliation of the urea-treated bulk MoS₂ (or WS₂) promoted the production of defect-rich NSs. Importantly, the defect-rich N–MoS₂ and N–WS₂ NSs exhibit enhanced peroxidase-like catalytic activity after being captured by bacteria, and can catalyze hydrogen peroxide (H₂O₂) to produce more toxic hydroxyl radicals (˙OH) than non-N-doped MoS₂ or WS₂ NSs. As a result, the N–MoS₂ or N–WS₂ NSs were capable of effectively killing Gram-negative ampicillin resistant Escherichia coli (Amp^rE. coli) and Gram-positive endospore-forming Bacillus subtilis (B. subtilis) and promoting bacteria-infected wound healing. This work not only provides a simple, universal exfoliation strategy for producing defect-rich N-doped TMD NSs but also provides a promising catalytic antibacterial option and has potential for many other catalytic applications.